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Various heaters like induction heater and steel processing equipment
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Advanced low temperature poly-silicon TFT-LCD implanter
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High-quality and less-damage thin film deposition with low temperature is possible by reaction between low pressure and high density ECR plasma flow, and sputtered particle.
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Semi conductor manufacturing equipment using CVD (Chemical Vapor Deposition) technology
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Rapid Tharmal Annealing System for low temperature poly-silicon TFT-LCD, OLED and solar battery etc.
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High purity ceramics such as Silicon Carbide, Alumina, Sapphire etc., for single parts, module parts and sub-assembly partts for semiconducting industry field
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Deposition system which enhances reliability of display by repairing defect in conventional encapsulation film using its excellent step coverage performance.
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